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Remove photoresist from surface of the wafer using Plasma, and remove photoresist from the semiconductor

2024-12-11 13:27:39
Remove photoresist from surface of the wafer using Plasma, and remove photoresist from the semiconductor
Remove photoresist from surface of the wafer using Plasma, and remove photoresist from the semiconductor

Minder-Hightech is a semiconductor manufacturer. Semiconductors are critical components of much of what makes modern life, such as mobile phones and computers. Now, there are a few steps in creating semiconductors, but the first step is to create a pattern on a flat surface known as a wafer.

In order to render this pattern, we deposit a special material on the wafer. This substance is known as a photoresist. Once we have put down the photoresist, we expose it to light. Under the light, an area of the photoresist is hardened and made strong. The areas in shadow remain soft and can be wiped away.

After obtaining the desired pattern on the wafer, the photoresist must be stripped from the areas where we will perform further processing. This is where Plasma Cleaner comes into play, literally.

Plasma-based methods for removal of photoresist

Plasma is a state of gas with a high level of energy, due to a high electric charge applied to it. And this activated gas is highly useful for stripping the photoresist on the wafer surface. Through plasma, the photoresist can become brittle and cleaning it becomes a lot easier.

We have two different techniques using plasma for the removal of photoresist: dry etching and ashing.

The dry etching: In this technique, the actual plasma that interacts with the photoresist. The plasma reacts with the photoresist where it makes contact. This reaction decomposes the photoresist and converts it into gas. This gaseous substance can subsequently be cleaned off of the wafer surface, resulting in exposing the areas we require clean and available for progression.

Ashing — This is a different way to do it, in this method non-reactive plasma for the photoresist is used. The plasma shatters the photoresist into tiny, small pieces instead. Then these small pieces can be washed off the wafer. This approach is suitable and protects the wafer while removing the unnecessary photoresist.

Using reactive plasma for photoresist stripping

Plasma Surface Treatment is a very powerful tool which helps us to strips the toughest photoresist from the wafer. Plasma is incredible in its own right, but the best part is that we can turn it into a super selective agent. That means it can be tuned to only specifically react with the photoresist, not with the other materials below it.

For instance: If we have a pattern on the wafer where metal is placed under the photoresist, we can use a type of plasma that reacts with only the photoresist. Thus, we can etch away the photoresist without harming the metal underneath it. Now, this is very critical since we need all parts of the wafer to maintain its integrity during the process.

The Plasma Technique for Stripping Photoresist

Minder-Hightech employs new age plasma-tech in striping the photoresist from our wafers. This allows us to fabricate error-free semiconductors, which are high quality.

Quick, tunable to your needs Our systems are designed to integrate seamlessly into your workflow. This indicates that we are able to strip the photoresist in short. And because we are fast, we meet the full demand of our customers, delivering great products when they need them.

But our plasma systems are also very accurate, on top of their efficiency. What this precision provides us is the ability to remove solely the photoresist itself. Our technology prevents all other parts of the wafer from getting damaged by our process, and we can’t afford to do that. This methodical practice becomes all the more essential for the quality of the semiconductors we manufacture out there.

Plasma-induced Photoresist Removal on Semiconductors

So, in short, plasma is a super power that enables us to strip some photoresist off the wafer surface in a highly effective manner. We, at Minder-Hightech, apply the latest and best plasma technology to produce exactly zero-defective quality semiconductors. When it comes to plasma systems, our solutions are manufactured to equilibrate speed with accuracy, while still being very efficient. It means being able to meet the demands of our customers as well as delivering quality products without fail. That hops to improve the process of semiconductors as we use plasma removal technology that make our semiconductors as good as possible for all kind of electronic devices to be reliable gadgets.

 


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