1.MDAM-CMPA200 is an ideal grinding and polishing system for high-volume grinding and polishing of various material wafers (SiC, Sapphire, GaN, AlN...) components, such as filter materials, wedge materials, LCD panels, etc.
2.Four motor drives and four extra-large polishing heads allow up to 48 2" wafers to be polished simultaneously. Therefore, the MP series machine is ideal for use in a full-load production environment.
3.The machine's automatic control panel uses a portable touch screen control, and process parameters can be freely entered and changed.
4.Automatic control and intelligent loading/unloading systems can quickly polish wafers to epitaxial preparation surfaces. This system is particularly useful for the operation of hard substrate materials, and it can also operate wafers up to 8" ø.
5.MDAM-CMPA200 precision grinding and polishing machine includes a host, remote control system, fixture, vacuum system, filler system, grinding and polishing discs, etc.
6.MDAM-CMPA200 precision grinding and polishing machine, the host and all spare parts are made of highly corrosion-resistant materials, the whole machine is corrosion-resistant, and is suitable for chemical mechanical grinding and polishing of various semiconductor materials.
7.Through an independent remote control system, multi-machine joint control can also be achieved. Through a control terminal, multiple grinding and polishing machines can be controlled, which is convenient for changing process parameters during the process. It can also achieve precise numerical control of multiple processes at the same time, greatly improving work efficiency and process accuracy.
8.The automatic filling system can adjust the dripping speed according to different process requirements, and automatically shut down when the abrasive is used up to prevent damage to the sample when there is no abrasive.
9.The equipment control system has a timing function. After the preset time is reached, the system automatically shuts down.