Guangzhou Minder-Hightech Co.,Ltd.
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Guangzhou Minder-Hightech Co.,Ltd.
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Home> PR verwijdering RTP USC
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig

Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Apparatuur Ernstig

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Productomschrijving

BATCH PLASMA Halbleiderwafer Fotorezyst Verwijderingsmachine

De verwerkings temperatuur is laag en kan de plasma onder hoge druk onderhouden
DESCUM Wafer reiniging Natte verwijdering van fotorezyst Oppervlakte restanten verwijderen Verwijderen van fotorezyst resten na blootstelling en ontwikkeling
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious factory
Specificatie
Plasmabron
RF
magnetron
Vermogen
1000W
1250w
Toepassingsgebied
4~8 inch
4~8寸
Enkelvoudige verwerkingssliceaantal
4~6 inch=50 stuks\/8 inch=25 stuks
4~6 inch=50 stuks\/8 inch=25 stuks
Uiterlijk
1250x1630x1900mm
1250x1630x1900mm
Systeemcontrole
PC
PC
Automatiseringsniveau
AUTO
AUTO
Fabriek
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Productdetails
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Verpakking & Levering
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious factory
Bedrijfsprofiel
16 jaar ervaring in apparatuur export！ We kunnen u een oplossing bieden voor Semiconductor Front\/Back End Processen en Apparatuur!
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture

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