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  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment
  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment
  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment
  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment
  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment
  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment
  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment
  • Fully automatic dual chamber Rapid Thermal Processing system RTP equipment

Fully automatic dual chamber Rapid Thermal Processing system RTP equipment

Product Description

Rapid Thermal Processing

Provide reliable RTP equipment for compound semiconductors、SlC、LED and MEMS

Industry applications

* Annealing of silicide alloy
* Oxidation reflux
* Gallium arsenide process
* Other rapid heat treatment processes
Specification
Test Report
Coincidence of 20th degree curves
20 curves for temperature control at 850 ℃
Coincidence of 20 average temperature curves
1250 ℃ temperature control
RTP temperature control
1000 ℃ process
960 ℃ process, controlled by infrared pyrometer
LED process data
RTD Wafer is a temperature sensor that uses special processing techniques to embed temperature sensors (RTDs) at specific locations on the surface of a wafer, enabling real-time measurement of surface temperature on the wafer.

Real temperature measurements at specific locations on the wafer and the overall temperature distribution of the wafer can be obtained through RTD Wafer; It can also be used for continuous monitoring of transient temperature changes on wafers during the heat treatment process.
Packing & Delivery
Company Profile
We have 16 years of experience in equipment sales. We can provide you withone-stop Semiconductor frontend and back end Package Line Equipments solution from China!

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