structure | illustrate |
Exposing the countertop | Exposure area: countertop, substrate placement area |
Optical system | Laser emission molding area |
Environmental control system | Control the internal temperature and positive pressure of the device |
Platform system | Controls the movement of the exposure table to complete the operation of the exposure path |
Control system | Control system of the entire equipment |
No. | Environment | Require |
1 | Light source environment | Yellow light |
2 | Temperature | 22℃±2℃ |
3 | Humidity | 50%±10% |
4 | Cleanliness | 1000 |
5 | CDA | 0.6±0.1Mpa，200LPM, dry, clean air |
6 | Power supply | 220~240V、50/60Hz、2.5KW；The ground wire must be grounded， |
7 | Cooling water | Temp.：10℃~ 20℃ Pressure：0.3MPa ~ 0.5MPa Flow rate：20L/min Pressure difference：0.3MPa以上 Take over caliber：Rc3/8 |
8 | Venue | level：±3mm/3000mm shake：VC-B Bearing：750kg/㎡ |
10 | Internet | One network port |
11 | Machine size | 1300*1100*2100mm |
12 | Device weight | 1500kg |
No. | Project | Spec. | Remark |
1 | Resolution | 0.6um/or other requirement | AZ703、AZ1350 |
2 | CDU | ±10%@1um | |
3 | Substrate thickness | 0.2mm～4mm | |
4 | Date grid accuracy | 60nm | |
5 | Overlay | ±500nm | 130mmx130mm |
6 | Stitching accuracy | ±200nm | AZ703 |
7 | MAX exposure size | 190X190mm | |
8 | Throughput | ≥300mm2/min | ≤50mj/cm2； |
9 | light source | LD 375nm | |
10 | light power | 6W | |
11 | Energy uniformity | ≥95% | |
12 | light life | 10000hr |
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