Guangzhou Minder-Hightech Co.,Ltd.
EN
Guangzhou Minder-Hightech Co.,Ltd.
Get Quote

Guangzhou Minder-Hightech Co.,Ltd.

Home
About Us
MH Equipment
Solution
Oversea Users
Video
Contact Us
Home> PVD CVD ALD RIE ICP EBEAM
  • MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment
  • MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment
  • MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment
  • MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment
  • MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment
  • MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment

MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment

Get a Free Quote
Product Description

MDPS-560 Pyriform Double Chamber Sputtering System

Used for preparing single/multi-layer functional nanofilms including various hard, metallic, semiconducting and dielectric films for universities and science institutions.

Sputtering vacuum chamber, magnetron sputtering target, water-cooling substrate heating turntable, sample injection chamber, sample chamber, annealer, backwash target, magnet sample send mechanism, gas circuit, pumping system, vacuum measurement system, electrical control system and mounting base.
MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment manufacture
Specification
Type
MDPS-560 II
Main Sputtering Chamber
pyriform vacuum chamber, size:Φ560×350mm
Sample Injection Chamber
cylindrical and horizontal type, size: Φ250mm×420mm
Pumping System
independent compound molecular pump and mechanical pump set for main sputtering chamber and sample injection chamber.
Ultimate Vacuum
Main Sputtering Chamber
≤6.67×10-6Pa(after baking and degassing)
Sample Injection Chamber
≤6.67×10-4Pa(after baking and degassing)
Regain Vacuum Time
Main Sputtering Chamber
6.6×10-4Pa after 40 min.(pumping after short-time exposed to air and filled with dry nitrogen)
Sample Injection Chamber
6.6×10-3Pa after 40 min.(pumping after short-time exposed to air and filled with dry nitrogen)
Magnetron Target Module
5 permanent magnet targets; sizeΦ60mm(one of the targets can sputtering ferromagnetic material).All the targets can RF sputtering
and DC sputtering compatibly; and the distance between target and sample adjustable from 40mm to 80mm.
Water-cooling Substrate Heating Revolution Table
Substrate Structure
Six stations, heating furnace installed at one station, and the others are water cooling substrate station.
Size
Φ30mm, six pics.
Mode of motion
0-360°,reciprocate.
Heating
Max. Temperature 600℃±1℃
Substrate Negative Bias
-200V
Gas Circuit System
2-way Mass Flow Controller(MFC)
Sample Injection Chamber
Sample Chamber
Six simples one time
Annealer
Max. heating temperature 800℃±1℃
Resputtering Target Module
Resputtering cleaning
Magnet Sample Send System
Used for sample transporting between sputtering chamber and sample injection chamber.
Computer Control System
Sample rotation, baffle open and shut, and target position control
Floor Occupied
Main Set
2600×900mm2
Electrical Cabinet
700×700mm2(two sets)
Packing & Delivery
MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment factory
MDPS-560 Pyriform Double Chamber Sputtering System / Semiconductor industry equipment factory
Company Profile
We have 16 years of experience in equipment sales. We can provide you with One-stop Semiconductor Front-end and Back end Package Line equipments professional solution from China.

More Products

Inquiry

Copyright © Guangzhou Minder-Hightech Co.,Ltd. All Rights Reserved

Privacy Policy

Inquiry Email WhatsApp WeChat
Top
×

Get in touch