1. The device can vacuum adsorb a 5 "X5" square mask, with no special requirements for the thickness of the plate (ranging from 1 to 3mm).
2. The device can be applied to ф 100mm circular substrate;
3. Substrate thickness ≤ 5mm;
4. Lighting:
Light source: GCQ350Z ultra-high pressure mercury direct current mercury lamp is used.
Lighting range: ≤ ф 117mm Exposure area: ф 100mm
stay ф Within a range of 100mm, the unevenness of exposure is ≤ ± 3%, and the exposure intensity is>6mw/cm2 (this indicator is measured using a UV light source I-line 365nm).
5. This device adopts an imported time relay to control the pneumatic shutter, ensuring accurate and reliable operation.
6. This machine is a contact exposure machine that can achieve:
7. Hard contact exposure: Use pipeline vacuum to obtain high vacuum contact, vacuum ≤ -0.05MPa
8. Soft contact exposure: The contact pressure can raise the vacuum to between -0.02MPa and -0.05MPa.
9. Micro contact exposure: less than soft contact, vacuum ≥ -0.02MPa.
10. Exposure resolution: The resolution of hard contact exposure of this device can reach 1 μ Above m (the accuracy of the user's "plate" and "chip" must comply with national regulations, and the environment, temperature, humidity, and dust can be strictly controlled. Imported positive photoresist is used, and the thickness of the uniform photoresist can be strictly controlled. In addition, the front and rear processes are advanced).
11. Alignment: The observation system consists of two CCD cameras mounted on two single tube microscopes and connected to the display screen through a video cable.