Vacuum plasma host | ||||
Equipment size | 1230X1800X1100mm (width x height x depth) | |||
Weight | 450kg | |||
Power demand | AC380V, 50/60Hz, 5-wire, 30A | |||
Plasma generator specifications | ||||
Microwave power supply | Power | 0~1250W | ||
Frequency | 2.45GHz | |||
Vacuum system | ||||
Material | Aluminum alloy (customizable stainless steel chamber) | |||
Thickness | 25mm | |||
Internal dimensions of the cavity | 480mmX470mmX480mm | |||
Workspaces | 6 magazine sections | |||
ECR | Slotted Magazine provides ECR enhanced processing effect | |||
Plasma capability | ||||
Processing ability | 35um Pitch 40μm Bump 15X15mm Maximum Die size |
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