The MDAM-CMP100/150 grinding and polishing machine is a precision grinding and polishing equipment that covers applications such as semiconductor materials and optoelectronic materials. Mainly used for grinding and thinning of major semiconductor material chips such as silicon, silicon dioxide, and indium antimonide focal plane chips, as well as chemical mechanical polishing of the bottom, surface, and end faces. The entire equipment and all components are fully anti-corrosion treated, and process parameters can be set through the touch screen interactive interface. Scientific and reasonable design, advanced performance, high degree of automation, convenient operation, convenient maintenance and strong reliability, sample substrate bonding, grinding thinning, chemical mechanical polishing, and the connection between the pre and post detection processes are reasonable, to ensure that the processing dimensions of each function of the equipment are consistent. By configuring different hardware and consumables, multiple machine configurations and process solutions can be achieved to meet various technical requirements such as different materials and sizes of users.
With the rapid development of semiconductor technology, the performance and functional requirements of integrated circuits continue to increase. TSV (Through Silicon Via) and TGV (Through Glass Via) technologies, as advanced packaging and interconnect technologies, can effectively improve the integration and performance of chips. This device has a unique process plan for implementing TSV/TGV technology.