* Infrared halogen lamp tube heating, cooling using air cooling;
* PlD temperature control for lamp power, which can accurately control temperature rise, ensuring good reproducibility and temperature uniformity;
* The inlet of the material is set on the WAFER surface to avoid cold point production during the annealing process and ensure good temperature uniformity of the product;
* Both atmospheric and vacuum treatment methods can be selected, with pre-treatment and purification of the body;
* Two sets of process gases are standard and can be expanded to up to 6 sets of process gases;
* The maximum size of a measurable single crystal silicon sample is 12inches(300x300MM);
* The three safety measures of safe temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection are fully implemented to ensure the safety of the instrument;