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  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS
  • Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED  MEMS

Semi-automatic RTP Rapid Thermal Processing for wafer semiconductor SlC LED MEMS

Product Description

Rapid Thermal Processing

Provide reliable RTP equipment for compound semiconductors、SlC、LED and MEMS
Feature
* Infrared halogen lamp tube heating, cooling using air cooling;
* PlD temperature control for lamp power, which can accurately control temperature rise, ensuring good reproducibility and temperature uniformity;
* The inlet of the material is set on the WAFER surface to avoid cold point production during the annealing process and ensure good temperature uniformity of the product;
* Both atmospheric and vacuum treatment methods can be selected, with pre-treatment and purification of the body;
* Two sets of process gases are standard and can be expanded to up to 6 sets of process gases;
* The maximum size of a measurable single crystal silicon sample is 12inches(300x300MM);
* The three safety measures of safe temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection are fully implemented to ensure the safety of the instrument;
Test Report
Coincidence of 20th degree curves
20 curves for temperature control at 850 ℃
Coincidence of 20 average temperature curves
1250 ℃ temperature control
RTP temperature control 1000 ℃ process
960 ℃ process, controlled by infrared pyrometer
LED process data
RTD Wafer is a temperature sensor that uses special processing techniques to embed temperature sensors (RTDs) at specific locations on the surface of a wafer, enabling real-time measurement of surface temperature on the wafer.

Real temperature measurements at specific locations on the wafer and the overall temperature distribution of the wafer can be obtained through RTD Wafer; It can also be used for continuous monitoring of transient temperature changes on wafers during the heat treatment process.
Specification
Packing & Delivery
Company Profile
We have 16 years of experience in equipment sales. We can provide you withone-stop Semiconductor frontend and back end Package Line Equipments solution from China!

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