Semiconductor industry ICP lab type PR removal machine Photoresist Residual Removal , China Semiconductor industry ICP lab type PR removal machine Photoresist Residual Removal Manufacturers, Suppliers, Factory

Product Description

ICP lab type PR removal Photoresist Remover machine

ASHING
Polymer removal
DESCUM
Dry removal of hard mask layer
Photoresistance removal after female ion implantation
Removal of optical resistance between media
Photoresistance removal in BAW/SAW process
Dry cleaning of anti reflective graphic film layer Y
Silicon oxide or silicon nitride etching
Surface residue removal
Surface cleaning after etching
Silicon carbide etching

Semiconductor industry ICP lab type PR removal machine Photoresist Residual Removal supplier

Process

Semiconductor industry ICP lab type PR removal machine Photoresist Residual Removal factory

Semiconductor industry ICP lab type PR removal machine Photoresist Residual Removal details

Advantage:

Core Advantage

High degumming rate: High-density plasma, fast degumming rate
Stability: After plasma treatment, high reproducibility
Remote plasma: Remote plasma, low ion damage to wafer
Featured software: independent research and development of software, intuitive process animation, detailed data and records
Uniformity: Plasma can control pressure and temperature through butterfly valve
Safety factor: Low plasma reduces damage to product discharge.
After-sales service: Fast response and sufficient inventory
Dust control: Meet customer requirements.
Core technology: With nearly 40% of the R&D team members

Cassette Platform (MD-ST 6100/620)

1. 4 Wafer Carriers
2. High compatibility: the flexibility of wafer size selection brings high cost and solution efficiency
3. High stability vacuum transfer chamber:
The mature and stable vacuum transmission design has been maturely applied in the market for many years and is well recognized by customers.
Turntable design, compact space, significantly reducing the risk of PARTICAL
4. Humanized software operation interface:
Intuitive humanized software operation interface, real-time monitoring of machine running Status;
Comprehensive alarm and fool-proof functions to avoid mis-operation.
Powerful data export function, records of various process parameters, and export of product production records.

Robot

1. One time dual wafer pick and place design brings high productivity
2. Improve space efficiency.

Heating Plate

1. High-precision temperature control wafer plate
Wafer heating plate from room temperature to 250°C, temperature control accuracy ±1°C
Wafer heating plate has been calibrated by professional instruments, and the uniformity. Within ±3°C, ensure the uniformity of glue removal
2. Single-chamber dual-wafer processing
Single-chamber dual-wafer design;
Independent power discharge design for each wafer, ensuring that each wafer. Round PR removal effect;
Under the premise of ensuring UPH efficiency, reduce product cost. Strong compatibility
3. Production capacity: double-piece design reaction chamber, high production efficiency.

Semiconductor industry ICP lab type PR removal machine Photoresist Residual Removal manufacture

Specification

PLASMA source			RF+BIAS
Power	1000W	1000W
Power		600W	600W
Applicable scope			4-8 inches
Single processing slice count			one
Appearance dimensions			1140mm x 1050mm x 1620mm
System control			Industrial control system
Automation level			Manual

Hardware Capability
Uptime/Available time	≧95%
Mean time to clean （MTTC）	≦6 hours
Mean time to repair（MTTR）	≦4 hours
Mean time between failures（MTBF）	≧350 hours
Mean time between assistant（MTBA）	≧24 hours
Mean wafer between broken（MWBB）	≦1 in 10,000 wafers
Heating plate control	50-250°

Test Report

Factory View

Packing & Delivery

Company Profile

We have 16 years of experience in equipment sales. We can provide you withone-stop Semiconductor frontend and back end Package Line Equipments solution from China!