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  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious
  • Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious

Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious

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Product Description

BATCH PLASMA Semiconductor Wafer Photoresist Removal Machine

The processing temperature is low and can maintain the plasma under high pressure
DESCUM Wafer cleaning Wet removal of photoresist Surface residue removal Removing photoresist residue after exposure and development
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious factory
Specification
PLASMA source
RF
microwave
Power
1000w
1250w
Applicable scope
4~8 inch
4~8寸
Single processing slice count
4~6 inch=50 piece /8inch=25 piece
4~6 inch=50 piece/8 inch=25 piece
Appearance dimensions
1250x1630x1900mm
1250x1630x1900mm
System control
PC
PC
Automation level
Auto
Auto
Factory
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious supplier
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Product Details
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Packing & Delivery
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious factory
Company Profile
16 years of experience in equipment export！ We can provide you with a one-stop Semiconductor Front / Back End Processes and Equipment solution!
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious details
Semiconductor Wafer Plasma Photoresist Removal Machine PR Removal Equipment Serious manufacture

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