Model |
MDAM-CMP100 |
MDAM-CMP150 |
|
Wafer size |
4 inches and below |
6 inches and below |
|
Working plate diameter |
420mm |
420mm |
|
Station |
≤4 |
≤2 |
|
Feed port |
≤3 |
||
Power supply |
220V、10A |
||
Timing |
0-10h |
||
Ambient temperature |
20℃~35℃ |
||
Plate speed |
0-120rpm |
||
Fixture rate |
0-120rpm |
Sample fixing system component |
Clamp, roller arm |
Lapping process assembly |
Lapping plate, plate repairing block, and cylinder |
Polishing process assembly |
Polishing fluid feeding system and polishing plate |
Detection component |
Test benchmark platform,flatness tester,pressure test gauge |
Wafer lapping and polishing material package |
Lapping powder,polishing solution,polishing cloth,wax, dewaxing fluid,glass substrate sheet |
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