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product inductive coupling plasma etching system icp semiconductor equipment-42
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  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment
  • Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment

Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment

Paglalarawan ng produkto
Inductive coupling plasma etching (icp) system
Inductive Coupling Plasma Etching System ( ICP ) Mga detalye ng kagamitan sa Semiconductor
Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment supplier
Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment factory
Resulta ng Proseso

Quartz / silicon / grating etching

Gamit ang BR mask para mag-etch ng mga materyales na quartz o silicon, ang grating array pattern ay may pinakamanipis na linya hanggang 300nm at ang sidewall steepness ng pattern ay malapit sa > 89° , na maaaring ilapat sa 3D display, micro optical device, optoelectronic na komunikasyon, atbp
Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment factory

Compound / semiconductor etching

Ang tumpak na kontrol ng sample na temperatura sa ibabaw ay mahusay na makokontrol ang etching morphology ng GaN based, GaAs, InP at mga metal na materyales. Ito ay angkop para sa mga asul na lED na aparato, laser, optical na komunikasyon at iba pang mga aplikasyon.
Inductive Coupling Plasma Etching System ( ICP ) Paggawa ng kagamitang semiconductor

Pag-ukit ng materyal na batay sa silicone

ito ay angkop para sa pag-ukit ng mga materyales na batay sa silikon tulad ng Si, SiO2, at SiNx. Maaari kong mapagtanto ang pag-ukit ng linya ng silikon sa itaas ng 50nm at pag-ukit ng malalim na butas ng silikon sa ibaba 100um
Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment factory
detalye
Configuration ng proyekto at diagram ng istraktura ng makina
Bagay
MD150S-ICP
MD200S-ICP
MD150CS-ICP
MD200CS-ICP
MD300C-ICP
Laki ng Produkto
≤6 pulgada
≤8 pulgada
≤6 pulgada
≤8 pulgada
Custom≥12inches
SRF Power source
0~1000W/2000W/3000W/5000WAdjustable,automatic matching\,13.56MHz/27MHz
Pinagmulan ng BRF Power
0~300W/0~500W/0~1000WAdjustable, automatic matching,2MHz/13.56MHz
Molecular pump
Hindi kinakaing unti-unti : 600 /1300 (L/s)/Custom
Anti-corrosion:600 /1300 (L./s)/Custom
600/1300(L/s) /Custom
Foreline pump
Mechanical pump / dry pump
Anti corrosion dry pump
Mechanical pump / dry pump
Pre pumping pump
Mechanical pump / dry pump
Mechanical pump / dry pump
Proseso ng presyon
Hindi nakokontrol na presyon/0-0.1/1/10Torr na kinokontrol na presyon
Uri ng gas
H2/CH4/O2/N2/Ar/SF6/CF4/
CHF3/C4F8/NF3/NH3/C2F6/Custom
(Hanggang sa 12 na channel, walang kinakaing unti-unti at nakakalason na gas)
H2/CH4/O2/N2/Ar/SF6/CF4/CHF3/ C4F8/NF3/NH3/C2F6/Cl2/BCl3/HBr/
Custom(Hanggang 12 channel)
Saklaw ng gas
0~5sccm/50sccm/100sccm/200sccm/300sccm/500sccm/1000sccm/Custom
LoadLock
Oo hindi
Oo
Halimbawang kontrol ng tem
10°C~Roomtem/ -30°C~150°C /Custom
-30°C~200°C/Custom
Paglamig ng helium sa likod
Oo hindi
Oo
Proseso ng cavity lining
Oo hindi
Oo
Kontrol ng tem ng dingding ng lukab
Hindi/Room tem-60/120°C
Tem ng kwarto~60/120°C
Control System
Auto/custom
Pag-ukit ng materyal
Silicon-base: Si/SiO2/
SiNx/ SiC.....
Mga organikong materyales:PR/Organic
pelikula......
Silicon-base: Si/SiO2/SiNx/SiC
III-V: InP/GaAs/GaN......
IV-IV: SiC
II-VI: CdTe......
Magnetic na materyal / haluang metal na materyal
Mga metal na materyales: Ni/Cr/Al/Cu/Au...
Mga organikong materyales: PR/Organic na pelikula......
Silicon deep etching
Pag-iimpake at Paghahatid
Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment supplier
Inductive Coupling Plasma Etching System ( ICP ) Mga detalye ng kagamitan sa Semiconductor
Profile ng Kompanya
Mayroon kaming 16 na taong karanasan sa pagbebenta ng kagamitan. Maaari kaming magbigay sa iyo ng One-stop Semiconductor Front-end at Back end Package Line equipment na propesyonal na solusyon mula sa China.
Inductive Coupling Plasma Etching System ( ICP ) Semiconductor equipment supplier

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