Reactive ion etching system
Professionally Provide Customized Solutions for Customers
Dual chamber RIE (Cl₂) customization
In February 2024, we received a request from a customer for a 100mm wafer Chlorine process.
This is an interesting application for us because the required process gas contains toxic gases Cl2 and BCl3. We have to improve all the configurations of the machine to avoid safety issues, and specially designed a dual-chamber structure of the process chamber and the transfer chamber to perfectly protect the operator while meeting the process requirements.
After about 5 months of design and production, we conducted multiple sample tests and production simulations in the company's internal laboratory, and quickly delivered the equipment after passing the customer's acceptance.
Guangzhou Minder-Hightech Co.,Ltd.
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